Applications

  • Bulk gas analysis
    • Service
      Parameter(s)
      Range(s)
      Background
      Model
      ​Ultra high purity inert gases used in fabrication of wafers
      ​​​​​1. Gas phase etching - blanketing
      2. Annealing furnace - blanketing
      3. Desposition of Dopant - carrier gas
      4. Pipe line verification - leak check
      5. Analysis at point of use - at tool location
      ​PPB O2
      ​0-50 ppb
      ​UHP - N2, H2, AR and He
      NA

      UltraTrace 3000

  • Excimer laser system
    • Service
      Parameter(s)
      Range(s)
      Background
      Model
      ​Laser exciter / F2 mixer gases
      ​Percent F2
      ​0-2, 0-7%​
      ​He or Neon
      6000
      (UV)